Major experimental and technological facilities

  • Dual chamber molecular beam epitaxy (MBE) Compact-21 system from Riber, for growth of (InAlGa)N and ZnO, each equipped with up to 11 source cells. Both chambers are interconnected enabling sample transfer under ultra high vaccum.
  • Three ALD reactors: F-120 from Microchemistry, TSF200 from BENEQ and Savannah-100 from Cambridge NanoTech for growth of thin II-VI films. The latter enables ultra-low temperature growth (substrate temperature below 200oC).
  • Liquid phase epitaxy and electroepitaxy of III-V compounds.
  • Ultra-high resolution (1 nm) scanning electron microscope equipped with an X-ray microanalysis system for composition mapping and a cathodoluminescence system for high resolution imaging and spectroscopy in the wavelength range of 200-1000 nm.
  • Ultra-high vacuum setup equipped with an Auger spectrometer and low energy electron diffraction (LEED) system for surface atomic structure studies.
  • High resolution Fourier Transform Infrared Spectrometer from BOMEM
  • Photoluminescence and photoluminescence excitation setup covering the wavelength range from ultraviolet to infrared (pulsed OPO system in the range of 210-2300 nm, Ti:sapphire cw laser in the range of 700-1100 nm).
  • Photoluminescence under high hydrostatic pressure in a diamond anvil cell.
  • Hollographic setup for four wave mixing.
  • Setup for magnetooptics up to 7 T
  • Electon spin resonance X- band spectrometer.
  • Optically detected magnetic resonance at 40 and 60 GHz.
  • Laplace/conventional deep level transient spectroscopic (DLTS) systems, enabling Minority Carrier Transient Spectroscopy (MCTS), Photo Induced Current Spectroscopy (PICS), application of uniaxial stress, and VIS-NIR illumination continuous and pulsed.
  • Panalytical X'Pert Pro MRD X-Ray Difractometer
  • Atomic Force Microscope VECO – Dimension ICON – PT.

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