Centre of Photon, Electron and Ion Advanced Methods for Natural Science http://info.ifpan.edu.pl/cepheus/

Workshop on Advanced Methods for Interpretation of TEM, X-Ray and SIMS Measurement in Nano and Atomic Scale
1-3 June 2005 Institute of Physics, Polish Academy of Sciences Warsaw, Poland PROGRAM
1 June	Wednesday
9:00-9:30	Registration
9:30-10:15	K. Scheerschmidt (Max Planck Institute of Microstructure Physics, Halle, Germany) Molecular dynamics modeling for enhanced interpretation of TEM images PART I
10:15-10:30	Coffee break
10:30-11:15	K. Scheerschmidt (Max Planck Institute of Microstructure Physics, Halle, Germany) Molecular dynamics modeling for enhanced interpretation of TEM images PART II
11:15-11:45	A. Sanchez (Universidad de Cádiz, Spain) Plasmon peak in EElS. The beginning of a new technique to determine the strain in semiconductor heterostructures
11:45-12:15	E. Knudsen (Risø National Laboratory, Roskilde, Denmark) Algorithms and Instrumentation for generating 3D grain maps in polycrystals by 3DXRD PART-I
12:15-13:30	Lunch break
13:30-14:00	E. Knudsen (Risø National Laboratory, Roskilde, Denmark) Algorithms and Instrumentation for generating 3D grain maps in polycrystals by 3DXRD PART-II
14:00-14:45	M. Hÿtch (CECM‑CNRS, Vitry-sur-Seine, France) Geometric phase analysis for measuring strain in nanostructures: challenges and recent advance PART‑I
15:00-17:00	Short orals and training: Individual participants subject choice , discussion panels in small groups
19:00	Barbecue in open air (if the weather is fine) or Get together in the Old Town
2 June	Thursday
9:30-10:15	M. Hÿtch (CECM‑CNRS, Vitry‑sur‑Seine, France) Geometric phase analysis for measuring strain in nanostructures: challenges and recent advances PART‑II
10:15-11:00	A. Rosenauer (IFP‑University Bremen, Germany) Composition evaluation by lattice fringe analysis (CELFA) in semiconductors nanostructures investigation
11:00-11:15	Coffee break
11:15-13:00	Training: Individual participants subject choice
13:00-14:00	Lunch break
14:00-15:00	M. Bersani (Physics and Chemistry of Surface and Interface Division, Povo‑Trento, Italy) Ultra Shallow Depth Profiling by SIMS in microelectronic materials and processes
15:00-15:45	H. Renevier (CEA, Département de Recherche Fondamentale sur la Matière Condensée SP2M/Nanostructures et Rayonnement Synchrotron, Grenoble, France) Grazing Incidence Anomalous Diffraction and Diffraction Anomalous Fine Structure (GIDAFS) to study nanostructures PART‑I
15:45-16:00	Coffee break
16:00-16:45	H. Renevier (CEA, Département de Recherche Fondamentale sur la Matière Condensée SP2M/Nanostructures et Rayonnement Synchrotron, Grenoble, France) Grazing Incidence Anomalous Diffraction and Diffraction Anomalous Fine Structure (GIDAFS) to study nanostructures PART‑II
16:45-17:30	S. Hovmöller (Stockholm University, Sweden) Computer aided electron crystallography as powerful tool to structure determination PART‑I
17:30-18:00	I. Demchenko (IP PAS, Poland) EXAFS as a tool for investigation the local environment of Ge atoms in buried low‑dimensional structures
3 June	Friday
9:00-9:45	S. Hovmöller (Stockholm University, Sweden) Computer aided electron crystallography as powerful tool to structure determination PART‑II
9:45-10:30	B. Pałosz (UNIPRESS, Warszawa, Poland) Diffraction study of nanocrystals under ambient and non-ambient conditions PART‑I
10:30-10:45	Coffee break
10:45-11:30	B. Pałosz (UNIPRESS, Warszawa, Poland) Diffraction study of nanocrystals under ambient and non-ambient conditions PART‑II
11:30-12:00	P. Galindo (Universidad de Cádiz, Spain) The Peak Pairs strain mapping algorithm and its application to HRTEM images
12:30-14:00	Lunch break
14:00-15:30	V. Holý (Masaryk University, Czech Republik) X-ray investigation of self-organized semiconductor nanostructures
15:30-17:00	Discussion panels in small groups and closing remarks